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Methods for Enhanced Atomic Layer Deposition
Technology Description Oregon State university researchers have created a method and device for in-situ microwave annealing to assist
Atomic Layer deposition (ALD)
. This technology will allow for improved ALD film properties at lower temperatures. The technology allows for improvements such as eliminating the need to remove the substrate and film between...
Published: 3/19/2024
|
Inventor(s):
John Conley
Keywords(s):
Atomic layer deposition (ALD)
,
energy enhanced ALD
,
in-situ annealing
,
microwave annealing
Category(s):
Chemical
,
Device
,
Engineering
,
Materials Science
,
Nanoscience & Microtechnologies
,
Physical Science
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